Early in the 1960s an old research technique named chemical vapour phase deposition cvd which has several unique advantages developed into the most widely used technique for thin film preparation in electronics technology. Purchase thin films by chemical vapour deposition volume 7 1st edition print book e book isbn 9780444988010 9781483291734. Chemical vapor deposition cvd is a vacuum deposition method used to produce high quality high performance solid materials the process is often used in the semiconductor industry to produce thin films. Cvd deposition technique is among the most prominent techniques used for synthesis of high quality and high performance thin films in semiconductors industry physical structure and chemical composition of the thin films can be customized by controlling the deposition conditions solgel process or liquid phase deposition process
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